| 摘要 |
PURPOSE:To prevent a lens-formation layer from mixing with a flat layer by a method wherein a flat layer consisting of negative resist layers in which bridging reaction has been produced with far ultraviolet rays is formed and then patterned to form a lens by heat-flow method so as to easily obtain a flat and thick film. CONSTITUTION:A photo-electric conversion region 11, a signal read-out region 12, a light-shield layer 13, and color filters 15-17 are formed on a semiconductor substrate 10. After a bridging-type negative resist layer 21a is formed with Spin coating method, sufficient bridging is produced with far ultraviolet rays to form a flat resin layer 18 by repeating this process. Then, a lens resin layer 19 is formed on a sensitive resin flat layer 18 and patterned and then, made into a lens with heat-flow process. The sensitive resin flat layer 18 is made flat and immeltable so that the sensitive resin flat layer 18 does not mix with the resin layer 19 when the lens resin layer is coated. Therefore, no failure occurs when the lens resin layer 19 is patterned, and also it is made possible to increase the temperature when the lens resin layer 19 is made into a lens by heat-flow method. |
