| 摘要 |
PURPOSE:To facilitate the increase in area of the film, improvement in productivity, and mass productivity, while contriving the improvement in film properties, film-forming speed, and reproducibility, and the uniformity in film quality, by a method wherein an active species A produced by decomposing a compound containing germanium and halogen and an active species B produced out of a carbon-containing compound are separately introduced, which are then made to chemically react by the action of discharge energy, thus forming a deposited film. CONSTITUTION:Under the coexistence of an active seed A produced by decomposing the compound containing germanium and halogen and an active species B produced out of a film-forming carbon-containing compound, the chemical interaction by these species is caused by making discharge energy act on them or promoted and amplified. Film formation is enabled by lower discharge energy than conventional, and the formed deposited film very hardly receives adverse effects such as etching or another action, e.g. abnormal discharge. |
