发明名称 Dual filament ion source with improved beam characteristics
摘要 A Freeman type electron bombardment ion source includes dual filament electrodes positioned in an arc chamber having a slit for extraction of an ion beam. The filament electrodes are symmetrically positioned with respect to the extraction slit. The filament electrode currents are equal in magnitude and oppositely directed. As a result, lateral magnetic fields in the region of the extraction slit are substantially eliminated.
申请公布号 US4608513(A) 申请公布日期 1986.08.26
申请号 US19840650014 申请日期 1984.09.13
申请人 VARIAN ASSOCIATES, INC. 发明人 THOMPSON, WILLIAM B.
分类号 H01J27/14 主分类号 H01J27/14
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