| 摘要 |
PURPOSE:To reduce and simplify processes by integrally forming an inter-layer insulating film in a matrix wiring section for a discrete electrode and a protective film to a photoconductive film by the same material. CONSTITUTION:An inter-layer insulating film 3 for a matrix wiring section M in a discrete electrode S and a protective film 3 to a photoconductive conversion film 2 are shaped integrally by the same material. Consequently, both the inter-layer insulating film and the protective film are formed simultaneously, thus largely shortening processes, then improving yield at low cost. A through- hole 4 may be shaped only through exposure and photosensitive processes especially when photosensitive polyimide in polyimide is employed as the material for the inter-layer insulating film and the protective film 3, thus further reducing and simplifying processes, then resulting in convenient manufacture. |
