发明名称 SAMPLE REPLACING MECHANISM FOR VACUUM DEVICE
摘要 PURPOSE:To establish dry vacuum formation by feeding a sample from a frist sample chamber to a second sample chamber, achieving advance or retreat of a feed mechanism in a condition releasing it from engagement with a sample holder and introducing the sample from the second sample chamber to the first sample chamber. CONSTITUTION:A sample holder 4 provided in a sample chamber 1 is transferred to a sample exchangeable position. The sample chamber 1 is communicated by opening a gate valve 3 with the a sample replacing chamber 2 and a chuck/unchuck mechanism 13 is introduced, by switching the lever 13 (9) of the chuck mechanism 13, to the sample chamber 1. In this case, a roller 13 (8) at the top end of the chuck/unchuck lever 13 (2) meets with the slot of the sample holder 4 within the sample chamber 1, subsequently the sample holder 4 is drawn out to the sample replacing chamber 2 by reversely rotating a feed screw. The gate valve 3 is closed, the sample chamber 1 is separated in vacuum from the sample replacing chamber 2, subsequently the atmosphere introduced into the sample replacing chamber 2 is made equivalent to the atmospheric pressure, a lid 16 is opened by revolving it around a fulcrum 15 and a silicon wafer 5 is replaced. Thereby, dust generated in replacing the sample can be prevented and dry vacuum formation can be established.
申请公布号 JPS61181050(A) 申请公布日期 1986.08.13
申请号 JP19850021321 申请日期 1985.02.06
申请人 HITACHI LTD 发明人 OTAKA TADASHI
分类号 H01J37/20;H01L21/027;H01L21/30 主分类号 H01J37/20
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