发明名称 ELECTRON BEAM IMAGE DRAWING APPARATUS
摘要 PURPOSE:To detect any reference marks made in individual deflected region in each region without detecting them on the position immedaitely below the deflection center of electron beams as well as to draw image patterns division in multiple regions continuously with excellent precision even if a sample is subject to remarkable warping. CONSTITUTION:Electron beams 2 projected from an electron gun 1 are converged into specified shape by an electromagnetic lens 4 to irradiate a sample 8. On the other hand, any data to be image-drawn normally stored in an outer memory of magnetic disk etc. are successively fed to a deflection control system 14 by a computer 18. The deflection control system 14 transmits deflective position signals and ON-OFF signals of electron beams 2 respectively to deflectors 6 and a controller 20 of blankers 5 to draw specified image on the sample 8. On the other hand, any deflected positions may be aligned, after locating the existing position of a stage 13, by means of imforming a stage driving system 17 of any target positions by a laser interferometer 19 to start a motor 16 stopping the stage driving system 17 by the interferometer 19 in the phase of stage 13 shifted to the target position.
申请公布号 JPS61174629(A) 申请公布日期 1986.08.06
申请号 JP19850013938 申请日期 1985.01.28
申请人 HITACHI LTD 发明人 NAKAMURA KAZUMITSU
分类号 H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/027
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