| 摘要 |
<p>ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS A chromium electroplating electrolyte containing a source of trivalent chormium ions, a complexant, a buffer agent and a sulphur species having S-O or S-S bonds for promoting chromium deposition, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 106 < K1 < 1012 M-1 and the sulphur species being selected from thiosulphates, thionates, polythionates and sulfoxylates. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid or citric acid.</p> |
