发明名称 METHOD FOR REMOVING SEMICONDUCTOR WAFER IN CHUCK MECHANISM
摘要 PURPOSE:To release a wafer safely and surely by the pressure of ejected water and float it by injecting and ejecting water flow from a water injecting port of a concave area provided on a chuck mechanism body. CONSTITUTION:A concave area 2 forming a mechanism for adsorbing a wafer A to be ground is provided on a chuck mechanism body 1 of a grinding machine plurally according to the scale of the chuck mechanism body 1, and a water injecting port 3 for ejecting water flow is formed in the almost the center of the lower face. And ceramics 4 having porosity in porous condition or in vertical direction are rotatably fixed in the concave 2 by making them exposed on the surface of the concave 2 wholly or a little while holding a clearance 5 toward the bottom. Therefore, water is injected from the water injecting port 3 of the concave 2 drilled on the chuck mechanism body 1 to float the wafer A.
申请公布号 JPS61168439(A) 申请公布日期 1986.07.30
申请号 JP19850005786 申请日期 1985.01.18
申请人 SHIBAYAMA KIKAI KK 发明人 KOBAYASHI KAZUO
分类号 H01L21/683;B23Q3/08;B24B41/06;H01L21/67;H01L21/68 主分类号 H01L21/683
代理机构 代理人
主权项
地址