发明名称 |
Photosensitive composition. |
摘要 |
<p>A photosensitive composition comprising an azide compound represented by the formula:
<Chemistry id="chema01" num="0001"><Image id="ia01" he="21" wi="76" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.</p> |
申请公布号 |
EP0189271(A2) |
申请公布日期 |
1986.07.30 |
申请号 |
EP19860300234 |
申请日期 |
1986.01.15 |
申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
NONOGAKI, SABURO;IRIE, RYOTARO;HASHIMOTO, MICHIAKI;IWAYANAGI, TAKAO |
分类号 |
G03C5/08;C07D263/38;G03F7/004;G03F7/008;G03F7/038 |
主分类号 |
G03C5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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