发明名称 Photosensitive composition.
摘要 <p>A photosensitive composition comprising an azide compound represented by the formula: &lt;Chemistry id="chema01" num="0001"&gt;&lt;Image id="ia01" he="21" wi="76" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.</p>
申请公布号 EP0189271(A2) 申请公布日期 1986.07.30
申请号 EP19860300234 申请日期 1986.01.15
申请人 HITACHI CHEMICAL CO., LTD. 发明人 NONOGAKI, SABURO;IRIE, RYOTARO;HASHIMOTO, MICHIAKI;IWAYANAGI, TAKAO
分类号 G03C5/08;C07D263/38;G03F7/004;G03F7/008;G03F7/038 主分类号 G03C5/08
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