发明名称 IONIZATION PLASMA PAINTING METHOD AND APPARATUS
摘要 The ion plasma vapour deposition process comprises… introducing a product (6) into the vacuum chamber (1),… evacuating active gases from the vacuum chamber (1) until the fore-vacuum has been attained,… shutting off the fore-evacuation pump (14),… introducing an inert gas into the vacuum chamber (1),… evacuating the active gases from the vacuum chamber until the working pressure is reached,… vapour-depositing a coating onto the product (6) under an inert gas and… after vapour deposition of the coating, interrupting the evacuation of the active gases from the vacuum chamber (1) and admitting air thereinto, the subsequent evacuation of the air from the vacuum chamber being carried out to a pressure of 6...66 Pa. …<??>The system for carrying out the process makes use of the unit for generating a high vacuum with a magnetron pump (16) which is connected to the vacuum chamber (1) via a block valve (18), while the inert-gas inlet appliance (26) is connected to the magnetron pump (16) which is provided with a device (24) for monitoring the residual atmosphere. …<??>The invention can be used in vacuum vapour deposition technology. …<IMAGE>…
申请公布号 JPS61157677(A) 申请公布日期 1986.07.17
申请号 JP19850286851 申请日期 1985.12.19
申请人 URAJIMIIRU PETOROBUITSUCHI PETORAKOFU;GENNADEI PETOROBUITSUCHI MINKIN;URAJIMIIRU AREKUSANDOROBUITSUCHI SHIYAGUN;PABUERU SEMENOBUITSUCHI BARIKIN;DABUIDO ISAAKOBUITSUCHI BARUKURON;URADEIMIIRU AREKUSANDOROBUITSUCHI DOMURACHIEFU 发明人 URAJIMIIRU PETOROBUITSUCHI PETORAKOFU;GENNADEI PETOROBUITSUCHI MINKIN;URAJIMIIRU AREKUSANDOROBUITSUCHI SHIYAGUN;PABUERU SEMENOBUITSUCHI BARIKIN;DABUIDO ISAAKOBUITSUCHI BARUKURON;URADEIMIIRU AREKUSANDOROBUITSUCHI DOMURACHIEFU
分类号 H01J37/32;C23C14/00;C23C14/22;C23C14/32;C23C14/34;C23C14/46;C23C14/52;C23C14/54 主分类号 H01J37/32
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