发明名称 |
MASK FOR OBTAINING TEXTURED PATTERNS IN RESIST LAYERS USING X-RAY LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<p>In a mask for X-ray lithography, in which a pattern of a layer corresponding to the structure to be manufactured and consisting of a material opaque to visible light is applied to a thin diaphragm of a material transparent to X-ray radiation, an adjustment with visible radiation, such as laser light, is made possible using a diaphragm consisting of a material opaque to visible light and using adjustment windows of a material transparent to the visible light of the spectrum through the diaphragm.</p> |
申请公布号 |
EP0104684(A3) |
申请公布日期 |
1986.07.09 |
申请号 |
EP19830201241 |
申请日期 |
1983.08.31 |
申请人 |
PHILIPS PATENTVERWALTUNG GMBH;N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
HARMS, MARGRET;LUTHJE, HOLGER;MATTHIESSEN, BERND;BRUNS, ANGELIKA |
分类号 |
G03F1/22;H01L21/027;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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