发明名称 ELEMENT COATED WITH ANTISTATIC COMPOSITION FOR PHTOGRAPHY
摘要 <p>Photographic base elements and radiation-sensitive elements are protected against the adverse effects resulting from accumulation of static electrical charges by incorporating therein an antistatic layer. Such layer is prepared from a coating composition comprising a hydrophilic binder, an anionic fluorinated surfactant and an inorganic nitrate.</p>
申请公布号 JPS60258542(A) 申请公布日期 1985.12.20
申请号 JP19850040283 申请日期 1985.02.28
申请人 EASTMAN KODAK CO 发明人 MIRAA DONARUDO ENU;KITSUDO RICHIYAADO EI
分类号 C09K3/16;G03C1/79;G03C1/85 主分类号 C09K3/16
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