发明名称 |
ELEMENT COATED WITH ANTISTATIC COMPOSITION FOR PHTOGRAPHY |
摘要 |
<p>Photographic base elements and radiation-sensitive elements are protected against the adverse effects resulting from accumulation of static electrical charges by incorporating therein an antistatic layer. Such layer is prepared from a coating composition comprising a hydrophilic binder, an anionic fluorinated surfactant and an inorganic nitrate.</p> |
申请公布号 |
JPS60258542(A) |
申请公布日期 |
1985.12.20 |
申请号 |
JP19850040283 |
申请日期 |
1985.02.28 |
申请人 |
EASTMAN KODAK CO |
发明人 |
MIRAA DONARUDO ENU;KITSUDO RICHIYAADO EI |
分类号 |
C09K3/16;G03C1/79;G03C1/85 |
主分类号 |
C09K3/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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