发明名称 |
Stencil, stencil material kit and stencil duplicator kit containing the same |
摘要 |
This invention provides stencil from which a patternwise perforated stencil can be easily made by handwritting, a stencil material kit with which a patternwise perforated stencil can be made, and a stencil duplicator kit which, in combination with the stencil, performs simple, clear printing. The stencil is made up of a porous support and a masking film formed thereon, said masking film being made of a water-insoluble polymer having tertiary amino groups. The stencil material kit contains the stencil and a patternwise perforated stencil-making solution which forms a water-soluble product upon reaction with said polymer. Stencil printing is performed using the patternwise perforated stencil, a stencil duplicator and printing ink.
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申请公布号 |
US4597829(A) |
申请公布日期 |
1986.07.01 |
申请号 |
US19850709278 |
申请日期 |
1985.03.07 |
申请人 |
PILOT MAN-NEN-HITSU KABUSHIKI KAISHA |
发明人 |
SATO, MORIO;IGAWA, TATSUYA |
分类号 |
B41C1/14;(IPC1-7):B44C1/22;C03C15/00;C03C25/06 |
主分类号 |
B41C1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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