发明名称 Stencil, stencil material kit and stencil duplicator kit containing the same
摘要 This invention provides stencil from which a patternwise perforated stencil can be easily made by handwritting, a stencil material kit with which a patternwise perforated stencil can be made, and a stencil duplicator kit which, in combination with the stencil, performs simple, clear printing. The stencil is made up of a porous support and a masking film formed thereon, said masking film being made of a water-insoluble polymer having tertiary amino groups. The stencil material kit contains the stencil and a patternwise perforated stencil-making solution which forms a water-soluble product upon reaction with said polymer. Stencil printing is performed using the patternwise perforated stencil, a stencil duplicator and printing ink.
申请公布号 US4597829(A) 申请公布日期 1986.07.01
申请号 US19850709278 申请日期 1985.03.07
申请人 PILOT MAN-NEN-HITSU KABUSHIKI KAISHA 发明人 SATO, MORIO;IGAWA, TATSUYA
分类号 B41C1/14;(IPC1-7):B44C1/22;C03C15/00;C03C25/06 主分类号 B41C1/14
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