| 摘要 |
PURPOSE:To enable the exposure by a high luminance X-ray without the incident damage of ion beams by arranging a wafer side in parallel to a plasma axis so as to expose it in radial direction of a cylindrical plasma generated by Z- pinch and providing a means for making the X-rays in parallel between an X-ray source and an exposed plane. CONSTITUTION:A discharge tube 1 has a concentric cylinder structure and a cylindrical plasma 2 is generated between the electrodes 11 and 12 by magnetic Z-pinch. In radial direction of the discharge tube 1, a mask 3 and a wafer 4 closely contacting with the mask 3 are placed in parallel to an axis of the discharge tube. A slit 5 which is one of the means for making the X-ray parallel is arranged between the plasma 2 and the mask 3 and an X-ray transmitting film 6 is placed while closely contacting with the slit 5. Assuming that a diameter of the cylindrical plasma 2 is (d), a length is l, a distance between the X-ray source 2 and the mask 3 is L, the mask 3 is a square with side D, if a length l of the X-ray source is given, (y) is determined so as to satisfy y/d>(L-y)/l. A length Z of a longitudinal side of the slit 5 is defined by Z> D-y(D-d)/L. |
