| 摘要 |
PURPOSE:To enable high quality and high yield to be obtained by improving the gas utilization factor by a method wherein the raw material gas introduced into a vacuum reaction layer is passed through a cathode made of stainless mesh. CONSTITUTION:The cathode 4 is made of a porous material having fine holes, through which the raw material gas can be passed, such as stainless mesh, and an earth shield 5 of the back of the cathode 4 is provided with an opening 11. A gas exhaust port 9 is formed by installing an exhaust pipe 12 leading out of the bath to this opening 11. The raw material gas introduced into the vacuum reaction bath 1 through a raw material gas supply port 8 is exhausted out of the bath through the cathode 4. This construction allows the raw material gas introduced into the bath to necessarily pass through a plasma decomposition area, much improving the film production speed and increasing the gas utilization factor. Besides, under the condition of a sufficient amount of supplied gas, photoelectric conductivity much increases, and high-quality films can be produced. |
