| 摘要 |
<p>A conductive laminate comprising a base (2) having provided thereon, in sequence, an interlayer (3) composed of an amorphous metal oxide or semimetal oxide, and a transparent conductive layer (4) composed of a crystalline metal or metal oxide. The conductive layer (4) is made of Au, Pd, Cr, Ni, SnO2, In2O3, ZnO, TiO2, CdO, CdO-SnO2 or ITO, and the interlayer (3) is made of SnO2, ITO, SiO2 or AlO3. The thickness of the conductive layer (4) is 200 to 10000 A &cir& o, and that of the interlayer (3) 80 to 300 A &cir& o.</p> |
