发明名称 MASK PATTERN
摘要 <p>PURPOSE:To allow automation of inspection by forming standard patterns at positions being apart by an equal distance from centers of pellet frames respectively in at least three corners corresponding to the pellet frames and obtaining the center positions of the pellet frames based on these standard patterns. CONSTITUTION:Three standard patterns 14 are formed in advance at positions corresponding to three corners in each pellet frame so as to make distances l1, l2 and l3 from each center point up to each center position S0 of each pellet frame equal with each other respectively. This allows each center position of each pellet frame to be easily obtained by utilizing standard patterns 14 provided three by three, even if scribed lines for drawing each pellet frame are not formed on a photomask 10. The inspection of the relative position of each target 13 and each pattern 12 with respect to each center position S0 allows whether each target 13 and each pattern 12 are correctly formed at required positions to be easily inspected.</p>
申请公布号 JPS6195521(A) 申请公布日期 1986.05.14
申请号 JP19840216151 申请日期 1984.10.17
申请人 HITACHI LTD 发明人 DAN MASAHIRO
分类号 G03F1/00;G03F1/38;H01L21/027;H01L21/30 主分类号 G03F1/00
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