METHOD FOR COATING PHOTORESIST

摘要

PURPOSE:To prevent striation phenomenon of a photoresist film by providing a step for coating a substrate with the solvent of a photoresist before a step for coating it with a photoresist. CONSTITUTION:Most of the striation phenomenon accompanied by evaporation of the photoresist can be prevented by coating the substrate with the solvent of the photoresist, such as acetone, and after that, coating it with the photoresist.