发明名称 METHOD AND DEVICE FOR PROCESSING PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To extend the lives of a rinsing soln. and a fat-insensitizing soln. by preventing introduction of a development processing soln. and a resin into the rinsing soln. and the fat-insensitizing soln. CONSTITUTION:An exposed photosensitive lithographic plate is passed through the first developing bath, most of the resin component eluted from the plate is dissolved in the first bath. In the second developing bath 2, a minute amt. of the residual photosensitive layer is dissolved off, and the resin component remaining on the plate due to imperfect squeegeeing is also washed off. The development processing soln. is rinsed off further in a circulating water rinsing bath, and the plate is brought into the rinsing step or the fat-insensitizing step, and neither of the development processing soln. nor the resin component is not brought into these steps, thus permitting deterioration of performances or capabilities of the rinsing soln. and the insensitizing soln. to be prevented in these steps, and the lives of these solns. to be extended.
申请公布号 JPS6152646(A) 申请公布日期 1986.03.15
申请号 JP19840174593 申请日期 1984.08.21
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 NAKAI HIDEYUKI;KOMENO ATSUO;UEHARA MASABUMI;KIYONO MINORU
分类号 G03F7/00;G03F7/30 主分类号 G03F7/00
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