| 摘要 |
PURPOSE:To prevent the generation of interference fringes by forming the 1st and 2nd layers on a substrate, having >=1 pair of non-parallel boundary faces within a small area and distributing a material which governs conductivity in at least one layer thereof ununiformly in the layer thickness direction. CONSTITUTION:A photoreceptive layer 1000 is formed on the substrate 1001 of a photoreceptive member 1004. The 1st layer 1002(G) contains the atoms of Ge and Si and the 2nd layer 1003(S) contains amorphous Si and has photoconductivity. At least either of H or halogen (X) atom is incorporated into the layers G and S if necessary. The Ge atoms in the layer G are distributed uniformly and continuously in each direction. The material which governs conductivity is incorporated into at least either of the layers G and S ununiformly in the thickness direction. The respective layer boundary faces have >=1 pair of the non-parallel faces and the many non-parallel faces are smoothly connected and arrayed in the plane vertical to the layer thickness direction. The generation of the interference fringes and the spots in the stage of reversal development is prevented and the manufacture of the excellent product is made easy. |
