| 摘要 |
PURPOSE:To pierce a hole having a gently inclined sectional shape in a photosensitive org. resin layer by forming light shielding substance layers patterned so as to change continuously the transmittance in the multilayered structure. CONSTITUTION:A light shielding substance layer 12a for the principal nontransmission part of a photomask is formed on a substrate 11 of quartz glass, Corning glass or the like. Plural light shielding substance layers 12b-12f are further formed on the layer 12a in succession, and a pattern is formed by photoetching so as to change continuously the light transmittance as shown by figure (b). When a photosensitive org. resin layer such as a polyimide layer is exposed through the resulting photomask 10, a contact hole 6b having a gently inclined sectional shape according to the transmittance is pierced. Wiring 4Y formed in an insulating film 6 between layers is connected to wiring 4X through the hole 6b. Thus, the breaking of a wire is prevented at a part having difference in level, and the yield of multilayered wiring is increased. |
