PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING IT

摘要

A photosinsitive resin composition comprises more than 0.001 wt.% benzotriazol, benzimidazol, benzothiazol, their derivatives, its acid salt, or an amine salt(a) ; more than 0.001 wt.% phosphoric acid salt(b) habing formula (CH2=CR1-CO-O-CH2-CHR2-O-)n -PO-(-OH)3-n; 20 - 80 wt. parts of organic thermoplastic vinyl copolymer(C); 20 - 80 wt. parts of photopolymerization unsaturated compd.(d) having terminal ethylene gp.; and 0.5 - 10 wt. parts of a sensitivity increasing agent(e); where R1 = H or methyl, R2 = H or -CH2X, X = H or halogen, and n = 1 or 2.