发明名称 ION BEAM APPARATUS
摘要 PURPOSE:To reduce leakage of magnetic field to the target and substrate by employing such system where the plasma is confined by means of magnetic field to be produced through N and S poles of permanent magnet arranged alternatively. CONSTITUTION:A plasma generating container 32 forming a plasma generating chamber will also function as an anode for producing arc discharge between a cathode 31. 16 rows of permanent magnets 33 magnetized vertically are provided on the outercircumference of the container 32 while alternating the polarity and two permanent magnets having same width and height and predetermined length are on the side of holding a filament 31. Consequently, leakage of magnetic field is reduced to the level of terrestrial magnetism resulting in reduction of leakage to the target and the substrate.
申请公布号 JPS60258839(A) 申请公布日期 1985.12.20
申请号 JP19840114594 申请日期 1984.06.06
申请人 HITACHI SEISAKUSHO KK 发明人 SATOU TADASHI;KUROSAWA TOMOE;FUJIWARA SHIGETAKA;HIGAKI MASARU
分类号 H01J37/317;C23C14/22;C23F4/00;H01F41/14;H01F41/18;H01J37/305;H01J37/32;H01J37/34;H01L21/203 主分类号 H01J37/317
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