| 摘要 |
<p>A mask substrate (32) for use in X-ray transparent member (10) which is stretched over a fixture to a predetermined tension and then adhered to a borosilicate glass ring (16). In accordance with a preferred embodiment, the composite member includes a film (12) of polyborane which has been grown in compression, onto which a polymide (14) is coated. The polyborane film is grown on a silicon wafer, coated with the polyimide, after which the central area of the wafer is etched away. The borasilicate glass is adhered to the polyimide side of the composite, leaving the tensioned polyborane surface open for the application of an X-ray absorptive pattern (36) thereto to define a complete mask structure (38) suitable for use in X-ray lithography.</p> |
