| 摘要 |
PURPOSE:To enhance resolution, heat resistances, etc., by exposing electron beams to a resist material contg. the mixture of an alkali-soluble polymer or copolymer, and a vinyl type copolymer represented by a specified general formula. CONSTITUTION:The resist soln. is prepared by dissolving, in a solvent, such as ethyl cellosolve, a mixture of the alkali-soluble polymer or copolymer, and a vinyl type copolymer represented by formula I or II (in which R2, R4 are H, lower alkyl, an aromatic or heterocyclic group, and at least one of them is an aromatic or heterocyclic group). A sharp positive type resist pattern corresponding to a desired pattern is obtained by coating a substrate with this resist soln. to form a resist film, exposing it to electron beams in the desired pattern, and developing it with an alkali developing soln. |
