发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE:To secure a wafer so that the plane thereof is perpendicular to light rays regardless of any possible warpage of the wafer, by employing an electrostatic wafer chuck. CONSTITUTION:An electrostatic chuck 7 secures a wafer 3 thereon by means of electrostatic force so that the plane of the wafer 3 is perpendicular to light rays 1. This is effected because the electrostatic force is sufficiently strong, and the wafer 3 can be retained in this state even if it has warpage. The wafer 3 is removed by blowing air against it through air holes 6. Since the chuck 7 reliably secures the wafer 3 so that the plane thereof is perpendicular to the light rays, there is no offset of focal point within the wafer 3, so that it is possible to increase the production yield.
申请公布号 JPS60235423(A) 申请公布日期 1985.11.22
申请号 JP19840093482 申请日期 1984.05.08
申请人 MITSUBISHI DENKI KK 发明人 SHIMIZU MASAHIRO;MIHASHI JIYUNICHI
分类号 H01L21/30;G03F7/20;H01L21/027 主分类号 H01L21/30
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