| 摘要 |
PURPOSE:To enable rapid photographic etching of one or both faces of a glass bases by repeating resist coating and prebaking, properly arranging the steps of exposure, development, etching, etc., and conveying the glass bases to each step with a conveyor. CONSTITUTION:Each steps of photographic etching is arranged in the order of (a) washing; (b) resist coating; (c) prebaking; (d) resist coating; (a) prebaking: (f) exposing; (g) resist coating; (h) prebaking; (i) developing; (j) etching; (k) removing; and (l) washing. Glass bases 1 each having an electrically conductive transparent filme are conveyed to each step at least one time with conveyors, and photoetching is executed selectively in some steps. For example, in the series A, the operation are executed in the steps of (a)-(c), (f), and (i)-(l), and the steps of (d), (e), (g), (h) are out of operation. In the series B, selective operations are executed like-wise in each step, and both faces are photoetched. In the series C, both faces are etched in different patterns. Since both and single faces of the glass base can be etched, it is suitable to etching for manufacture of a liquid crystal device. |
