发明名称 PLATING APPARATUS
摘要 A plating apparatus for automatic plating of objects to be plated such as IC lead frames in a plural number in considerably high speed as a whole process line in which plural number of aligned object to be plated in the form of strips is conveyed laterally at a time on the conveyed line which is formed with aligning rollers group and the feed rollers group, while conveying, the objects to be plated are carried out pre-treatment and after-treatment, between both of treatments, the plating treatment is carried out by injection of plating liquid to the objects to be plated, and as loading a vacuum apparatus moving with arc-shaped track is employed for transferring plural objects to be plated in one on a conveyor line.
申请公布号 SG36785(G) 申请公布日期 1985.11.15
申请号 SG19850000367 申请日期 1985.05.16
申请人 ELECTROPLATING ENGINEERS OF JAPAN LIMITED 发明人
分类号 B65G49/02;B65G49/04;C25D5/02;C25D7/00;C25D17/06;C25D17/28;H01L23/48;(IPC1-7):B65G49/02 主分类号 B65G49/02
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