| 摘要 |
<p>PURPOSE:To enhance curability, film hardness, etching soln. resistance, peelability, and removability by incorporating a specified half ester, a rosin type compd. having 50-300 acid value, a compd. represented by the formula, a photopolymerizable monomer, and a photopolymn. initiator. CONSTITUTION:The half ester is obtained by the ordinary esterifiction reaction of a polybasic acid anhydride with hydroxyalkyl (meth)acrylate. As said rosin type compd., those having 50-300 acid value, such as rosin-modified maleic acid resin, rosin-modified phenol resin, polymerized rosin, and hydrogenated rosin, are used, preferably, in an amt. of 1-30wt% of the UV-curable resin compsn. The compd. represented by the formula in which R1, R2 are each H or methyl; and R3 is H, methyl, methylol, diacetonalkyl, or 1-4 conductive substrate alkoxymethyl is used, preferably, in an amt. of 1-30wt% of said resin compsn. As the photopolymerizable monomers, those high in dilution effect and low in viscosity are preferable. As the photopolymerization initiator, those good in storage stability as the UV curable resin compsn. are desirable.</p> |
