| 摘要 |
PURPOSE:To make the film thickness on plural substrates always uniform in a planetary type film forming apparatus by using a revolution type film thickness correction plate which is unreached near the rotation center of a substrate holder and fixing a stationary type film thickness correction plate near the revolution orbit of the rotation center. CONSTITUTION:The substrate holder assembled bodies 4 are fitted to an annular member 2 which is rotated around the vertical line passing through an evaporation source 1 with the fitting arms 3. The assembled bodies 4 are constituted of rotary bearings 5, friction wheels 6 and substrate holders 7 and the substrate holders 7 are rotated on their axes by means of the friction wheels 6 while the wheels 6 are rotated on a toric orbit 8 by means of revolution of the annular member 2. In this case, the film thickness on the plural substrates fitted to the substrate holders 7 is always controlled to uniform thickness by providing the revolution type film thickness correction plates 9 which are unreached near the rotation center of the substrate holders 7 and also fixing stationary type film thickness correction plates 12 near the revolution orbits of the substrate holders 7. |
