| 摘要 |
PURPOSE:To form a radiation sensitive material superior in sensitivity and resolution, and in resistance to various kinds of etching solns. by using a polymer contg. in the molecule, benzene ring structures each having dichloromethyl group as a substituent. CONSTITUTION:The polymer contains benzene rings each substd. by at least one chloromethyl group, CHCl2, on at least one of main or side chains of the polymer chains, preferably, in a concn. of 0.5-0.005 equiv. per 100g of the polymer. Since it does not have structures instable against exygen or heat, such as vinyl or epoxy groups, it is superior in storage stability, and since it has no sensitivity to the visible light, it can be handled in the light. |
