| 摘要 |
PURPOSE:To enhance reliability and utilization efficiency of an ion beam exposure device by a method wherein a phenomenon to destroy an emitter chip is removed prior to generation of an ion beam. CONSTITUTION:An emitter chip 1 is lifted up from the referential position using a pair of ion beam position regulators 10, a supplementary chip 16 is transferred up to the referential position using a position regulator 17, and the degree of vacuum is raised up to the degree to generate electric discharge. Then the supplementary chip 16 is held to positive in relation to pull-out electrodes 13, and the voltage thereof is raised gradually. When emission sources such as projections and impurities are existing on the pull-out electrodes 13, electric discharge is generated, while the electric discharge thereof is extinguished together with disappearance of the emission sources. When electric discharge is made as not to be generated even when the voltage of the supplementary chip 16 reaches the higher value than the application set voltage to the emitter chip 1, it is judged as that the emission sources of the pull-out electrodes 13 are removed, the supplementary chip 16 is kept away, and the emitter chip 1 is lowered up to the referential position. |
