发明名称 SHUTTER MECHANISM OF CORPUSCULAR RADIATION EPITAXIAL APPARATUS
摘要 PURPOSE:To obtain the titled shutter mechanism having a simple structure and capable of further evacuating a vacuum chamber by placing a rotating plate having openings in a radiation source chamber parallel to a cooling wall so that the openings can be made to coincide with the desired holes in the cooling wall by rotation. CONSTITUTION:During the operation of a corpuscular radiation epitaxial apparatus, in the radiation source chamber 12, useless corpuscular radiation not passing through a group of holes 16 in a cooling wall 11 are reflected by a shutter 20 or the wall 11 and discharged 21. The residue of the useless corpuscular radiation is adsorbed on the wall 11 cooled to the temp. of a refrigerant such as liq. N2 to keep the inside of the chamber 12 at a high vacuum. In the growing chamber 13, a crystal is grown on a substrate 2 with useful corpuscular radiation 26 passed through the holes 16. Corpuscular radiation useless for crystal growth in the corpuscular radiation 26 is discharged 25 as reflected corpuscular radiation 27 or adsorbed on the wall 11 to keep the inside of the chamber 13 at a high vacuum.
申请公布号 JPS60210595(A) 申请公布日期 1985.10.23
申请号 JP19840064821 申请日期 1984.03.31
申请人 SHIMAZU SEISAKUSHO KK 发明人 KIMATA MORIHIKO
分类号 C30B23/08;C30B23/06 主分类号 C30B23/08
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