| 摘要 |
<p>PURPOSE:To obtain a fixed form granular material unnecessitating grinding, abrasion, etc. by a method wherein a molten material is discharged in gas or in a vacuum in the condition of weightlessness, or epitaxial growth, CVD growth or etching is performed making the molten material to float in gas or in a vacuum in the condition of weightlessness. CONSTITUTION:A molten liquid or a solution 2 is put in a thermostable crucible 1 to be heated according to a heater 3 surrounding the crucible 1, inactive gas 5 such as Ar gas, etc. is blown against the solution 2 from a nozzle 4, and the generated pulverulent bodies 8 of the solution 2 is jetted from a nozle 7. Then Ar gas 5 is blown against the pulverulent bodies similarly from a nozzle 6 provided separately, the jetted pulverulent bodies 8 are pushed in a capture net 10, and cooled gradually according to a heater 9 provided to the outside periphery of the capture net 10. A device like this is operated in a vacuum at the universe space, and when the solution 2 is Si, it is formed into a diamond structural single crystal granular material. Further, the pulverulent bodies 22 are put in a quartz ampoule 21, reactive gas 22 is sealed therein, heated according to an outside heater 23, and epitaxial layers are grown on the surfaces of the pulverulent bodies 22.</p> |
