| 摘要 |
PURPOSE:To obtain a good coating state from the beginning, by imparting moving function to the photoresist emitting nozzle in a coating apparatus to a semiconductor substrate. CONSTITUTION:Moving function by a drive means 1 such as a motor is imparted to a photoresist emitting nozzle 3 equipped with a means 2 for emitting the solvent of a photoresist from the periphery of a photoresist emitting orifice. By this method, a good coating state is obtained from the beginning even after an apparatus has been stopped for a long time.
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