| 摘要 |
PURPOSE:To improve the moisture resistance of a diffraction grating pattern consisting of photoresist and to enable effective prevention of cracking of the diffraction grating pattern by providing a hexamethyl disilazane layer as a precoating layer. CONSTITUTION:A diffraction grating 35 is formed via a hexamethyl disilazane layer 33 on a glass substrate 31. An inter-grating spacing D can be controlled by the angle between the two luminous fluxes interfered on photoresist and the wavelengths of the luminous fluxes. Grating depth (h) can be controlled by controlling prebaking conditions, exposing time, developing time and concn. of a developing soln. The grating is then subjected to necessary post treatments such as rinsing, drying, and post baking. A hologram disc 36 is formed by forming a diffraction grating pattern 39 on a discoid glass substrate 37.
|
