发明名称 METHOD FOR REMOVING SEMICONDUCTOR WAFER IN CHUCK MECHANISM
摘要 PURPOSE:To pull up a wafer upward so as not to apply a load to an extremely thin wafer by injecting and jetting water flow from a water injecting port of a concave area drilled on a chuck mechanism body. CONSTITUTION:A concave 2 forming a mechanism for adsorbing a wafer A to be ground is provided on a chuck mechanism body 1 of a grinding machine plurally according to the scale of the chuck mechanism body 1, and a water injecting port 3 for ejecting water flow is formed in the almost the center of the lower face. And ceramics 4 having porosity in porous condition or in vertical direction are rotatably fixed in the concave 2 by making them exposed on the surface of the concave 2 wholly or a little while holding clearance 5 toward the bottom. And in the vicinity of the ceramics, plurality of transfer arm 6 of the wafer A provided with an air adsorbing pad 8 on its tip portion 7 and rotatably moving in the horizontal direction back and forth and liftable are supported with their axes set rotatably side by side.
申请公布号 JPS61168438(A) 申请公布日期 1986.07.30
申请号 JP19850005787 申请日期 1985.01.18
申请人 SHIBAYAMA KIKAI KK 发明人 KOBAYASHI KAZUO
分类号 H01L21/683;B23Q3/08;B24B41/06;H01L21/67;H01L21/68 主分类号 H01L21/683
代理机构 代理人
主权项
地址