| 摘要 |
PURPOSE:To form plural thin films while considerably reducing time loss by placing substrates and a substrate mask having a fan-shaped opening at a prescribed interval so as to enable the continuous masking of arbitrary substrates in vacuum. CONSTITUTION:Plural substrates 3a are attached to a rotatable round substrate holder 3, and a substrate mask 5 fastened to a substrate mask support 4 is placed so that it confronts the substrates 3a at 1-5mm. interval. The mask 5 has a fan-shaped window 5a. When sputtering is carried out in this state, a thin film is formed on only one of the substrates 3a. The conditions are then changed, and a thin film is formed on the next substrate by sputtering. |
