| 摘要 |
PURPOSE:To increase easily the durability of a titled antireflection film by forming a metallic thin film layer on the antireflection film consisting of a dielectric thin film provided on a plastic lens. CONSTITUTION:At least one dielectric thin film layer 3 (e.g., a magnesium fluoride layer) is formed on the surface of a plastic lens 1 by the vacuum vapor deposition method while keeping the plastic lens 1 at <=60 deg.C. Then a metallic thin film layer 4 consisting of elementary nickel or chromium or the alloy of both metals is formed thereon by the vacuum vapor deposition method while keeping the plastic lens 1 at <=60 deg.C. The obtained antireflection film has excellent resistance to humidity and heat, does not peel off and degenerate, and can be easily mass-produced. |
