发明名称 MOLECULAR BEAM EPITAXY DEVICE
摘要 PURPOSE:To detect the presence of a substrate on a transporter positively, and to facilitate the remote control of the transporter by providing a sensing means detecting the presence of the substrate on the transporter in a molecular beam epitaxy device in which the transporter on which the substrate is loaded is mounted movably in a carrying chamber for carrying the substrate to each treating chamber. CONSTITUTION:Conductive base plates 9A1, 9A2 buried to a transporter 8 made of a non-conductive material with a guide roller 13 rolling along a rail 7 made of a non-conductive material installed into a carrying chamber 5 are mounted to the transporter 8 in order to load a conductive substrate 15 after crystal growth. When the substrate 15 is loaded on the base plates 9A1, 9A2, currents flow and a conduction sensor 29 is operated because sliding contacts 21a, 21b are each brought into pressure-contact with buried plates 22, 24 for conduction through springs 20a, 20b by the load of the substrate. When the substrate 15 is removed from the base plates 9A1, 9A2, while the conduction sensor 29 is returned to an original state because currents stops by operation reverse to the one mentioned above. Accordingly, the presence of the substrate 15 on the base plates 9A1, 9A2 can be discriminated positively.
申请公布号 JPS60117614(A) 申请公布日期 1985.06.25
申请号 JP19830224143 申请日期 1983.11.30
申请人 HITACHI SEISAKUSHO KK 发明人 MIZUMOTO MUNEO;OKUNO SUMIO;FUJIOKA KAZUMASA;TAKAHASHI KUNIHIRO;SATOU KAZUO;YAMAGUCHI SUMIO;KURODA TAKAROU;TAMURA NAOYUKI
分类号 H01L21/203 主分类号 H01L21/203
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