发明名称 PHOTOSENSITIVE COMPOSITION FOR DRY DEVELOPMENT
摘要 PURPOSE:To obtain a photosensitive compsn. for dry development having good practicality by imparting photosensitive characteristic to a polymer by incorporating a specific aromatic azide compd. to the polymer. CONSTITUTION:The polymer to be used as a component should be one which is easily removable by converting to ash in plasma gas. It is also necessary that the polymer shows no tackiness when it is formed to film. Suitable aromatic azide compd. is one expressed by the formula I (wherein R1 is H, 1-3C alkyl, cyano, phenyl, phenoxy; R'1 is 1-3C alkyl, cyano, phenyl, phenoxy; R2 is 2-3C alkyl, cyano, phenyl, phenoxy; R3 is H, 1-3C alkyl, cyano, phenyl, phenoxy), independently of each other, and one expressed by the formula II.
申请公布号 JPS60114857(A) 申请公布日期 1985.06.21
申请号 JP19830221986 申请日期 1983.11.28
申请人 TOUKIYOU OUKA KOGYO KK 发明人 NAKANE HISASHI;YOKOTA AKIRA;YABUTA MITSUO;ISHII WATARU;TSUDA MINORU
分类号 G03F7/008;G03F7/038;G03F7/36;H01L21/027 主分类号 G03F7/008
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