发明名称 Process and apparatus for producing a continuous insulated metallic substrate.
摘要 <p>A process for producing a continuous web of an insulated metalic substrate, comprising the steps of depositing an insulation layer on a continuous web of a metalic substrate by plasma CVD method or sputtering method, and depositing a back electrode on the insulation layer by sputtering method or vapor deposition method. According to the present invention, the insulated metalic substrate for a solar cell or printed circuit board can be produced in a continuous manner and in high productivity and quality.</p>
申请公布号 EP0144055(A2) 申请公布日期 1985.06.12
申请号 EP19840114295 申请日期 1984.11.27
申请人 KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA 发明人 NAKAYAMA, TAKEHISA;NISHIMURA, KUNIO 187, BUKKOJI-DORI;TSUGE, KAZUNORI;TAWADA, YOSHIHISA
分类号 H05K3/44;C23C14/02;C23C14/56;C23C16/02;C23C16/54;H01L31/0392;H01L31/04;H01L31/18;H01L31/20;H05K1/05 主分类号 H05K3/44
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