| 摘要 |
PURPOSE:To obtain an antistatic photosensitive material for X-rays causing no contamination of a screen by incorporating a specified compound into a silver halide emulsion layer and a specified nonionic surfactant having polyoxyethylene chains into said emulsion layer or a hydrophilic colloidal layer. CONSTITUTION:At least one kind of compound represented by formula I (where Z is a group of atoms required to form a 5- or 6-membered heterocyclic ring consisting of C, N, O and S, and M is H, -NH4 or an alkali metallic atom) or by formula II (where each of R<1> and R<2> is -OH, -NHOH, -NH2, alkoxy or the like) is incorporated into a silver halide emulsion layer. At least one kind of nonionic surfactant represented by formula III or IV [where each of R1, R2, R6 and R8 is H, alkyl, aryl, alkoxy, halogen or the like; each of R5 and R7 is alkyl, aryl or the like; each of R3 and R4 is H, alkyl or aryl; R3 and R4, R5 and R6, and R7 and R8 may form each ring by bonding to each other; each of n1-n3 is 2-50; and (m) is 5-50] is further incorporated into said emulsion layer. An antistatic photosensitive material for X-rays causing no contamination of a screen is obtd. |
