发明名称 AUTOMATIC EXPOSURE CONTROLLER OF MULTIPLE PHOTOMETERY SYSTEM
摘要 <p>PURPOSE:To prevent exposure control from being disabled owing to the cutoff of light metering output by utilizing the light metering output before cutoff processing for momentary stop-down light metering. CONSTITUTION:The outputs of photometery circuits 101-104 are inputted to MCU122 through an analog switch circuit 120. The output of the circuit 100 is inputted to an aperture control means 155. This circuit 100 generates a light metering output for monitoring when an aperture and a shutter are controlled on momentary stop-down light metering basis. A shutter speed, open aperture, stop- down step number, and photographic film speed are set with potentiometers 105-108. A stop-down stop magnet 156 and a shutter magnet 180 are powered on and off with the output of arithmetic processing of the MCU122.</p>
申请公布号 JPS6064331(A) 申请公布日期 1985.04.12
申请号 JP19830173665 申请日期 1983.09.20
申请人 NIHON KOUGAKU KOGYO KK 发明人 SAEGUSA TAKASHI
分类号 G03B7/08;G03B7/091;G03B7/28 主分类号 G03B7/08
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