| 摘要 |
PURPOSE:To reduce the exfoliation of thin films and to easily obtain a thin film magnetic head having a stable characteristic at a high yield, by installing a magnet to a holding body and holding the backside of the thin film forming surface of a magnetic substance substrate by the holding body utilizing the magnetic attraction, and then, installing regular intervals between the bottom surface of a tank and the thin film forming surface with legs. CONSTITUTION:The cleaning device of a magnetic substance substrate for thin film magnetic head is composed of a holding main body 10, magnet 11, legs 12, handle 13, and cleaning tank 9. The cleaning work is performed in such a way that substrates 1 are put between projections 14 on a plane 15 by utilizing grooves 16 with a pair of tweezers, etc., with the backside 21 of the substrate 1 being contacted with and attracted by the magnets 11 and the substrates 1 are soaked into a cleaning liquid 8 until the bottom end surface 22 touches the bottom surface of the tank 9 by holding the handle 13 with hands with the legs 12 downward. Therefore, the thin film forming surface 21 of the substrate 1 faces to the bottom surface of the tank 9 with a fixed interval in between. Then an oscillator 9' is operated and the substrate 1 is subjected to ultrasonic cleaning. The magnetic force of the magnet 11 is set so that no substrate 11 drops down under this working condition and the setting work of the substrate 1 can be made easily. |
