发明名称 POLISHING METHOD
摘要 <p>PURPOSE:To make such polishing as taking proper viscosity attainable as well as to aim at simplification in aftertreatment of polishing, by polishing a glass plate used for an IC mask and/or optical component parts with an abrasive made up of being added with a polyvinyl alcohol aqueous solution. CONSTITUTION:As a practical example, a PVA aqueous solution is added by 50g .CeO2 to an abrasive, which polishes a glass base plate coming into a state of about 10mum porousness on a surface of the base plate consisting of SiO2, Na and Fe, whereby an abrasice content solution having a viscosity of about 10,100cp is produced, and when the said glass plate is polished for 5min long, the glass plate carrying the said porousness is polished of its porous part and therefore surface roughness comes to about 100Angstrom . In addition, washing after polishing becomes very easy as the polishing solution is different in case of using grease and, what is more, since the polyvinyl alcohol is excellent in wetness, drying in the glass plate after polishing and washing is quick enough, besides uniformity, and sticking of abrasives onto the glass surface will in no case happen.</p>
申请公布号 JPS6062458(A) 申请公布日期 1985.04.10
申请号 JP19830169439 申请日期 1983.09.16
申请人 FUJITSU KK 发明人 ARII KATSUYUKI;NAGASHIMA SETSUO
分类号 B24B37/00 主分类号 B24B37/00
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