Photopolymerizable compositions and elements containing acid to reduce scum and stain formation

摘要

Aqueous processable photopolymerizable compositions comprising a polymerizable ethylenically unsaturated monomer, a photoinitiator or photoinitiator system, and acid binder are described which give increased resistance to stain or scum formation on copper surfaces upon incorporation of an acid having a molecular weight not greater than 300 with a solubility of at least 0.01 grams in 100 grams water at 20 DEG C. and a dissociation constant in a range from 1x10-5 to 5x10-2. Water soluble acids which readily give up protons such as citric, malonic, malic, and maleic and are suitable.