| 摘要 |
PURPOSE:To realize a speed-up of a drying process, and to prevent an uneven drying by supplying a liquid developer by making a developing mask adhere tightly to an electrophotographic sensitized material, making a gas flow to a developing chamber in its state, and moving said material to a drying chamber in a state that a liquid film is left on the whole surface of a limited area. CONSTITUTION:A liquid developer does not leak out to other part than a photosensitive surface by supplying the liquid developer 4 by making a developing mask 2 adhere tightly to an electrophotography sensitized material 3. Also, a time required for drying is shortened by executing a liquid-break equeeze by making a gas flow in a state that the electrophotography sensitized material 3 exists in a developing chamber 12. Moreover, the liquid-break is limited to the extent that a liquid film of the liquid developer 4 is left on the whole surface, by which in case of moving the electrophotography sensitized material 3 to a drying chamber 3, even if a liquid held between said material and the developing mask 2 flows in, no uneven drying is generated because the whole is still wet by the liquid developer 4. |
