| 摘要 |
PURPOSE:To improve the pattern transfer accuracy by mounting a conductive member which passes a light between a light incident window and a photoelectric mask to prevent a Penning discharge from occurring. CONSTITUTION:A sample 13 and a photoelectric mask 14 provided for an electron beam transfer are opposed in a vacuum vessel 11. A high voltage is applied from a DC high voltage power source 19 between supporting bases 15 and 17, thereby applying an electric field along the opposing direction of the sample 13 and the mask 14. A metal mesh 22 is mounted between an ultraviolet light passing window 23 and the mask 14 to extremely reduce the amount of negative ions and electrons arriving at the window 23, thereby preventing the window 23 from being charged. Thus, a high voltage can be applied between the mask and the sample without a Penning discharge, thereby improving the pattern transfer accuracy.
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