发明名称 MANUFACTURE OF NEGATIVE TYPE LITHOGRAPHIC PLATE REQUIRIING NO DAMPENING WATER
摘要 PURPOSE:To form a photosensitive layer having good coating performance and to obtain a printing plate free from unevenness of coating, pinholes, etc. by forming the photosensitive layer contg. a quinonediazide compd. having specified contents of fluorine type and silicone type surfactants and further, forming a silicone rubber layer on this layer. CONSTITUTION:A quinone diazide compd. contg. at least one of F type or silicone type surfactants of, especially, nonionic type is contained in a photosensitive compsn. in an amt. of 0.01-5wt% of the total weight of the compsn. excluding a solvent. A base of an aluminum plate or the like is coated with a photosensitive coating soln. obtd. by dissolving said compsn. in an org. solvent, such as ethyl cellusolve or dioxane, and dried and heat treated to form a photosensitive layer free from defects, such as pinholes. Then, it is coated with a silicone rubber layer, and exposed imagewise, and processed with a usual developing soln. for use in a lithographic plate requiring no dampening water to obtain a superior negative type printing plate with high yield.
申请公布号 JPS59222843(A) 申请公布日期 1984.12.14
申请号 JP19830095806 申请日期 1983.06.01
申请人 TORAY KK 发明人 WATANABE KATSUMI;KAWABE NORIO
分类号 G03F7/022;G03F7/00;G03F7/004;(IPC1-7):G03F7/08;G03F7/02 主分类号 G03F7/022
代理机构 代理人
主权项
地址